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Cobalt Co sputtering targets use in thin film coating CAS 7440-48-4
$ 100.00 -
Bismuth (Bi) metal sputtering targets, purity; 99.99%, CAS: 7440-69-9
$ 100.00 -
Boron (B) sputtering targets, Purity: 99.9%, CAS ID: 7440-42-8
$ 200.00 -
Ruthenium (Ru) metal sputtering targets, Purity: 99.95%, CAS: 7440-18-8
$ 400.00 -
Aluminum (Al) metal sputtering targets CAS: 7429-90-5
$ 100.00 -
Silicon (Si) polycrystal, monocrystal sputtering targets CAS 7440-21-3
$ 100.00 -
Tantalum,Ta sputtering targets for plaane display thin film coating
$ 400.00 -
Molybdenum trioxide MoO3 granules use in thin film coating CAS 1313-27-5
$ 200.00 -
Titanium oxide Ti3O5 granules use in thin film coating CAS 12065-65-5
$ 300.00 -
Aluminum (Al) metal evaporation material CAS 7429-90-5
$ 200.00 -
Antimony Telluride Sb2Te3 targets CAS 1327-50-0
$ 500.00 -
Bismuth Telluride Bi2Te3 crystal CAS 1304-82-1
$ 2000.00 -
Tin Arsenide SnAs granules CAS 39332-13-3
$ 1000.00 -
Tin Telluride SnTe granules use in thermoelectric generator CAS 120404-02-7
$ 200.00 -
Tin Telluride SnTe targets use in thermoelectric generator CAS 120404-02-7
$ 200.00 -
Bismuth Selenide Bi2Se3 granules, powders use in semiconductor CAS 12068-69-8
$ 1500.00 -
Bismuth(III) sulfide Bi2S3 granules CAS 1345-07-9
$ 1500.00 -
Zinc Telluride ZnTe sputtering targets use in Optoelectronics CAS 1315-11-3
$ 200.00 -
Cadmium Telluride CdTe sputtering targets use in thin film coating CAS 1306-25-8
$ 200.00 -
Iron phosphide Fe3P, FeP granules CAS 12023-53-9
$ 1000.00
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