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Niobium nitride (NbN) ceramic sputtering target
$ 200.00 -
Nickeloxide NiOsputtering targets CAS:1313-99-1
$ 200.00 -
Vanadiumoxide (V2O5, VO2)sputtering targets, CAS:1314-62-1
$ 200.00 -
Zirconium oxide (ZrO2) sputtering targets, purity: 99.95%, CAS: 1314-23-4
$ 200.00 -
Titanium trioxide (Ti2O3) sputtering targets, purity: 99.99%, CAS: 1344-54-3
$ 200.00 -
Titanium oxide (TiO2) sputtering targets, purity: 99.99%, CAS: 13463-67-7
$ 200.00 -
Tin oxide (SnO2, SnO) sputtering targets, purity: 99.9%, CAS: 18282-20-5
$ 200.00 -
Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
$ 200.00 -
Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
$ 200.00 -
Molybdenum trioxide (MoO3) target use in thin film coating CAS 1313-27-5
$ 200.00 -
Tungsten oxide doped Lithium (WO3-Li) sputtering targets
$ 1000.00 -
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