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Home > 供应产品 > Silicon (Si) polycrystal, monocrystal sputtering targets CAS 7440-21-3

Silicon (Si) polycrystal, monocrystal sputtering targets CAS 7440-21-3

Price:US $100.00 / pc

Product Description

Silicon (Si) Sputtering targets

 

Purity: 99.999%, 99.9999%

​Type: Polycrystal, monocrystalline, N type, P type, Undoped

Size: max. 355.6mm (14 inch) Max,

Length: 500mm max x Width 200mm x thickness 20mm max.,

Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing

 

Silicon (Si) Sputtering targets for use in semiconductor, physical vapor deposition (PVD) display, chemical vapor deposition (CVD) and optical applications

 

 

We also supply below material:

 

Material Name

FormulaPurity
AluminumAl99.99%, 99.999%
AntimonySb99.99%, 99.999%
BoronB99.9%,99.99%, 99.999%
BariumBa99.3%, 99.9%, 99.95%
BismuthBi99.99%, 99.999%
GraphiteC99.99%
CobaltCo99.9%, 99.95%, 99.99%
ChromiumCr99.5%, 99.9%, 99.95%
CopperCu99.99%, 99.999%
CadmiumCd99.99%
IronFe99.9%, 99.99%
IndiumIn99.9%, 99.99%,99.999%
LithiumLi99.5%
MolybdenumMo99.95%
MagnesiumMg99.95%
NickelNi99.9%, 99.98%, 99.995%, 99.999%
NiobiumNb99.95%
LeadPb99.99%
RheniumRe99.95%, 99.99%
SiliconSi99.999%, 99.9999%,poly or mono crystal, doped or undoped
SeleniumSe99.99%, 99.999%
TelluriumTe99.99%,99.999%
TantalumTa99.95%, 99.99%
TitaniumTi99.7%, 99.99%, 99.995%, 99.999%
TinSn99.99%, 99.999%
TungstenW99.95%
VanadiumV99.9%

 

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