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Indium (In) sputtering targets CAS 7440-74-6
US$ 200.00 / pc1 pc (MOQ) -

Antimony (Sb) metal sputtering targets, Purity: 99.99%, CAS: 7440-36-0
US$ 200.00 / pc1 pc (MOQ) -

Tin(IV) sulfide SnS2 granules CAS1315-01-1
US$ 800.00 / kg0.01 kg (MOQ) -

Titanium Carbide TiC sputtering targets CAS 12070-08-5
US$ 200.00 / pc1 pc (MOQ) -

Silicon carbide (SiC) targets CAS 409-21-2
US$ 200.00 / pc1 pc (MOQ)

Iron phosphide Fe3P, FeP granules
Chemical formula: Fe3P, FeP
Molar mass: 198.51 g·mol−1
Density: 6.74 g/cm3
Melting point: 1,100 °C (2,010 °F; 1,370 K)
Solubility in water, Insoluble in water
Iron phosphide is a chemical compound of iron and phosphorus, with a formula of Fe3P. Its physical appearance is grey, hexagonal needles. Manufacturing of iron phosphide takes place at elevated temperatures, where the elements combine directly. Iron phosphide reacts with moisture and acids causing dangerous effects. The product could be a flame or a toxic substance.
Iron phosphide can be used as a semiconductor. It has use in high power, high frequency applications, such as laser diodes.
We also can supply other kinds of half semiconductor mateiral, like as Selenide, Sulfide, Telluride, Antimonide material
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Indium (In) sputtering targets CAS 7440-74-6
US$ 200.00 / pc1 pc (MOQ)Inquire Now -

Antimony (Sb) metal sputtering targets, Purity: 99.99%, CAS: 7440-36-0
US$ 200.00 / pc1 pc (MOQ)Inquire Now -

Tin(IV) sulfide SnS2 granules CAS1315-01-1
US$ 800.00 / kg0.01 kg (MOQ)Inquire Now -

Titanium Carbide TiC sputtering targets CAS 12070-08-5
US$ 200.00 / pc1 pc (MOQ)Inquire Now -

Silicon carbide (SiC) targets CAS 409-21-2
US$ 200.00 / pc1 pc (MOQ)Inquire Now