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Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0
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- ChinaGuang Dong
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Aluminum Nickel (Al-Ni) alloy sputtering targets use in evaporation or thin film coating
purity: 99.9%
Composition: Al/Ni=3/1at and Al/Ni=1/1at or made by request
Size: max. 355.6mm (14 inch) ,
Length: 500mm max x Width 200mm x thickness 20mm max.,
Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing
We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.
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