Niobium Niride (NbN) Ceramic sputtering target, NbN powder, NbN evaporation or thin film coating material

Powder：-625mesh, -325mesh，-200mesh，-160mesth, -100mesh e.t.c particle size

Sputtering Targets : Diameter: 355.6mm (14") max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Evaporation Material：Pieces: 1-4mm, 1-6mm, 3-6mm, 3-12mm e.t.c,  Tablets: 8-9mm dia. X 4-5mm thick, 10mm dia. X 10mm thick e.t.c

Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

Nitride Ceramic sputtering target 

Aluminum Nitride , AlN target                       Boron Nitride, BN target    

Niobium Niride , NbN target       

Silicom Nitride , Si3N4 target                        Tantalum Nitride , TaN target       

Titanium Carbon nitride , TiCN target                 Titanium Nitride, TiN target      

Vanadium Nitride , VN target                        

TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ......

The available made method include hot pressing , HP, , hot/cold isostatic pressing , HIP, CIP, , and vacuum melting, vacuum sintering

TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target to be best.