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Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
USD $200.00 / pc
1pc (MOQ)
- country
- ChinaGuang Dong
- stock
- Delivery period
- Ships within days after payment
- parameters：
- brand：TYR
TYR TECH MATERIAL LIMITED
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Product Details
Silicon dioxide (SiO2) sputtering targets
Purity 99.995%
Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing
Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree
Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
To make glass ceramics, abrasion agent, oil bleaching and purification ferrosilicon, determination boron, arsenic and silver, etc. Thin layer chromatography analysis with the board.
Good product recommendation
Product parameters
- brand：
- TYR
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